Invention Grant
- Patent Title: Off-axis projection optics and extreme ultraviolet lithography apparatus employing the same
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Application No.: US11358074Application Date: 2006-02-22
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Publication No.: US07274513B2Publication Date: 2007-09-25
- Inventor: Seung-Hyuk Chang , I-Hun Song , Won-Joo Kim , Suk-Pil Kim , Hoon Kim
- Applicant: Seung-Hyuk Chang , I-Hun Song , Won-Joo Kim , Suk-Pil Kim , Hoon Kim
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2005-0015051 20050223
- Main IPC: G02B9/00
- IPC: G02B9/00

Abstract:
Off-axis projection optics that includes first and second mirrors positioned off-axis and sharing a confocal point that are arranged to reduce linear astigmatism. If a distance between an object plane and the first mirror is l1, an incident angle of light coming from the object plane to the first mirror is i1, a distance between the first mirror and the confocal point is l1′, a distance between the confocal point and the second mirror is l2, an incident angle of light coming from the first mirror to the second mirror is i2, and a distance between the second mirror and an image plane is l2′, the off-axis projection optics may satisfy the following equation: l 1 ′ + l 1 l 1 tan i 1 = l 2 ′ + l 2 l 2 tan i 2 .
Public/Granted literature
- US20060188822A1 Off-axis projection optics and extreme ultraviolet lithography apparatus employing the same Public/Granted day:2006-08-24
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