发明授权
US07283294B2 Catadioptric projection optical system, exposure apparatus having the same, device fabrication method
失效
折反射投影光学系统,具有相同的曝光设备,器件制造方法
- 专利标题: Catadioptric projection optical system, exposure apparatus having the same, device fabrication method
- 专利标题(中): 折反射投影光学系统,具有相同的曝光设备,器件制造方法
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申请号: US11257785申请日: 2005-10-24
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公开(公告)号: US07283294B2公开(公告)日: 2007-10-16
- 发明人: Yuji Katashiba , Chiaki Terasawa , Hideki Morishima
- 申请人: Yuji Katashiba , Chiaki Terasawa , Hideki Morishima
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Morgan & Finnegan L.L.P.
- 优先权: JP2004-309129 20041025
- 主分类号: G02B17/08
- IPC分类号: G02B17/08
摘要:
A catadioptric optical system comprising a first imaging optical system including a concave mirror and forming an intermediate image of a first object, said first imaging optical system forming a reciprocating optical system that an incidence light and reflected light pass, a second imaging optical system for forming an image of the intermediate image onto a second object, and a first optical path deflective member, provided between the concave mirror and the intermediate image, for introducing a light from the first imaging optical system to the second imaging optical system, wherein said first optical path deflective member deflects a light in such a direction that a forward path of the first imaging optical system intersects a return path of the first imaging optical system, and wherein said intermediate image is formed without an optical element after a deflection.
公开/授权文献
信息查询
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |
G02B17/08 | .折反射系统 |