发明授权
US07286284B2 Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection
有权
用于模拟高光圈成像系统的显微镜成像系统和方法,特别是用于掩模检查
- 专利标题: Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection
- 专利标题(中): 用于模拟高光圈成像系统的显微镜成像系统和方法,特别是用于掩模检查
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申请号: US10917626申请日: 2004-08-13
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公开(公告)号: US07286284B2公开(公告)日: 2007-10-23
- 发明人: Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Stroessner
- 申请人: Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Stroessner
- 申请人地址: DE Jena
- 专利权人: Carl Zeiss SMS GmbH
- 当前专利权人: Carl Zeiss SMS GmbH
- 当前专利权人地址: DE Jena
- 代理机构: Reed Smith LLP
- 优先权: DE102004033603 20040708
- 主分类号: G02B23/00
- IPC分类号: G02B23/00
摘要:
An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.