发明授权
US07292428B2 Electrostatic chuck with smart lift-pin mechanism for a plasma reactor
有权
用于等离子体反应器的具有智能举升机构的静电卡盘
- 专利标题: Electrostatic chuck with smart lift-pin mechanism for a plasma reactor
- 专利标题(中): 用于等离子体反应器的具有智能举升机构的静电卡盘
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申请号: US11115951申请日: 2005-04-26
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公开(公告)号: US07292428B2公开(公告)日: 2007-11-06
- 发明人: Hiroji Hanawa , Andrew Nguyen , Kenneth S. Collins , Kartik Ramaswamy , Biagio Gallo , Amir Al-Bayati
- 申请人: Hiroji Hanawa , Andrew Nguyen , Kenneth S. Collins , Kartik Ramaswamy , Biagio Gallo , Amir Al-Bayati
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Law Office of Robert M. Wallace
- 主分类号: H02N13/00
- IPC分类号: H02N13/00
摘要:
A lift pin assembly for use in a reactor for processing a workpiece includes plural lift pins extending generally parallel with a lift direction, each of the plural lift pins having a top end for supporting a workpiece and a bottom end. A lift table faces the bottom ends of the pins and is translatable in a direction generally parallel with the lift direction. A small force detector senses a force exerted by the lift pins that is sufficiently large to indicate a chucked wafer and sufficiently small to avoid dechucking a wafer. A large force detector senses a force exerted by the lift pins in a range sufficient to de-chuck the wafer.
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