发明授权
- 专利标题: Vacuum processing apparatus
- 专利标题(中): 真空加工设备
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申请号: US11073652申请日: 2005-03-08
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公开(公告)号: US07296783B2公开(公告)日: 2007-11-20
- 发明人: Hideki Kihara , Tsunehiko Tsubone , Nobuo Nagayasu
- 申请人: Hideki Kihara , Tsunehiko Tsubone , Nobuo Nagayasu
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2005-026611 20050202
- 主分类号: F16K3/00
- IPC分类号: F16K3/00
摘要:
An inexpensive and reliable vacuum processing apparatus is provided. The vacuum processing apparatus comprises a sealed gate located between two vacuum vessels for allowing them to communicate with each other and a sample subjected to processing to be transferred from one of the vacuum vessels to the other therethrough; and a gate valve located on a path of the gate, the gate valve including a first and second valve body facing a first and second opening, respectively, and a shaft to which the valve bodies are coupled at one end thereof, the gate valve selectively opening and closing each of the openings. The gate valve includes an axial drive section coupled to the other end of the shaft for moving the shaft in the axial direction thereof, and a rotary drive section located between the one end and the other end of the shaft for rotating the shaft about a predetermined pivot crossing the axis of the shaft. The rotating force is transmitted to a spot on the shaft between the pivot and the other end along the axis of the shaft.
公开/授权文献
- US20060169939A1 Vacuum processing apparatus 公开/授权日:2006-08-03
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