发明授权
- 专利标题： Photobase generator and curable composition
- 专利标题（中）： 光碱发生剂和可固化组合物
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申请号： US11050740申请日： 2005-02-07
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公开(公告)号： US07300747B2公开(公告)日： 2007-11-27
- 发明人: Hitoshi Okazaki , Junya Hayakawa , Motoharu Takeuchi , Masahiro Jono , Kenji Ishii
- 申请人： Hitoshi Okazaki , Junya Hayakawa , Motoharu Takeuchi , Masahiro Jono , Kenji Ishii
- 申请人地址： JP Tokyo
- 专利权人： Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人： Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人地址： JP Tokyo
- 代理机构： Antonelli, Terry, Stout & Kraus, LLP.
- 优先权： JP2004-039081 20040216
- 主分类号： G03C1/73
- IPC分类号： G03C1/73 ; C08G59/40 ; C08G75/06 ; C08G75/14 ; C08L81/04 ; C07D331/02 ; G02B1/04
摘要：
The photobase generator of the invention is represented by the following formula 1: wherein Ar, R, A+ and X− are as defined in the specification. Since the photobase generator of the formula 1 absorbs ultraviolet lights of relatively long wavelength and is photolyzed to generate a strong base efficiently, a composition containing the photobase generator and an episulfide compound is easily cured by polymerization under ultraviolet irradiation.
公开/授权文献
- US20050181300A1 Photobase generator and curable composition 公开/授权日：2005-08-18
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