发明授权
- 专利标题: Functional film and method of pattern formation
- 专利标题(中): 功能膜和图案形成方法
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申请号: US11235708申请日: 2005-09-26
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公开(公告)号: US07303780B2公开(公告)日: 2007-12-04
- 发明人: Shinri Sakai , Toshimitsu Hirai
- 申请人: Shinri Sakai , Toshimitsu Hirai
- 申请人地址: JP
- 专利权人: Seiko Epson Corporation
- 当前专利权人: Seiko Epson Corporation
- 当前专利权人地址: JP
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: JP2004-306602 20041021
- 主分类号: B05D5/06
- IPC分类号: B05D5/06 ; B05D3/00
摘要:
A pattern forming method for forming a functional film with a prescribed pattern on a substrate using a droplet discharge method, the pattern forming method includes: a sub region configuration process for: configuring, in a design pattern of the functional film, a plurality of sub regions which divide the designing pattern; and categorizing the plurality of sub regions into a plurality of non-adjacent groups; a first drawing process for arranging the liquid substance so as to draw a sub region that belongs to a first group categorized in the sub region configuration process; and a second drawing process for arranging the liquid substance so as to draw a sub region that belongs to a second group categorized in the sub region configuration process; wherein a solidification process for solidifying the liquid substance arranged in the first drawing process is provided between the first drawing process and the second drawing process.
公开/授权文献
- US20060088701A1 Functional film and method of pattern formation 公开/授权日:2006-04-27
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