发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US10919530申请日： 2004-08-17
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公开(公告)号： US07304718B2公开(公告)日： 2007-12-04
- 发明人: Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker , Pieter Willem Herman De Jager , Kars Zeger Troost
- 申请人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker , Pieter Willem Herman De Jager , Kars Zeger Troost
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/54
摘要：
An array of individually controllable elements, comprising a plurality of control areas consisting of a plurality of rows of reflectors. Alternate rows of reflectors are actuated in a common manner such that the control areas function as a grating to provide a control element that can be used as a diffractive optical element.
公开/授权文献
- US20060038969A1 Lithographic apparatus and device manufacturing method 公开/授权日：2006-02-23
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