发明授权
- 专利标题: Photocurable compositions containing reactive particles
- 专利标题(中): 含有反应性颗粒的光固化组合物
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申请号: US10511924申请日: 2003-04-18
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公开(公告)号: US07307123B2公开(公告)日: 2007-12-11
- 发明人: David Johnson , John Wai Fong
- 申请人: David Johnson , John Wai Fong
- 申请人地址: US TX The Woodlands
- 专利权人: Huntsman Advanced Materials Americas Inc.
- 当前专利权人: Huntsman Advanced Materials Americas Inc.
- 当前专利权人地址: US TX The Woodlands
- 国际申请: PCT/EP03/04231 WO 20030418
- 国际公布: WO03/089991 WO 20031030
- 主分类号: C08L63/00
- IPC分类号: C08L63/00 ; C08F2/46
摘要:
A photocurable composition, including (a) a photocurable monomer, e.g. a cationically curable monomer and/or a radically curable monomer; (b) reactive particles comprising a crosslinked elastomeric core, e.g. made of polysiloxane material, and a shell of reactive groups on an outer surface of the core, wherein the reactive groups comprise epoxy groups, ethylenically unsaturated groups, or hydroxy groups; and (c) an appropriate photoinitiator, e.g. a radical photoinitiator; and a cationic photoinitiator. A method of making a 3-D object from such a composition and a 3-D object made by the method are also provided. The cured composition generally has a smooth surface. The use of the reactive particles makes the composition more stable and the particles do not readily separate out.
公开/授权文献
- US20050175925A1 Photocurable compositions containing reactive particles 公开/授权日:2005-08-11
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