发明授权
- 专利标题: Electron beam system and method of manufacturing devices using the system
- 专利标题(中): 电子束系统及其制造方法
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申请号: US11034873申请日: 2005-01-14
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公开(公告)号: US07312449B2公开(公告)日: 2007-12-25
- 发明人: Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
- 申请人: Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
- 申请人地址: JP Tokyo
- 专利权人: Ebara Corporation
- 当前专利权人: Ebara Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP.
- 优先权: JP2002/2233 20020109; JP2002/3317 20020110; JP2002/6971 20020116
- 主分类号: G01N23/00
- IPC分类号: G01N23/00
摘要:
An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted from an electron gun is irradiated onto a sample and secondary electrons emanated from the sample are detected. The electron gun is a thermionic emission type and designed to operate in a space charge limited condition. A shaping aperture and a NA aperture are arranged in front locations of the electron gun. An image of the shaping aperture formed by an electron beam emitted from the thermionic emission electron gun is focused onto a surface of the sample through the two-stage lenses.
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