发明授权
- 专利标题： Method for manufacturing a magnetic head coil structure and/or pole tip structure
- 专利标题（中）： 磁头线圈结构和/或极尖结构的制造方法
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申请号： US10815429申请日： 2004-03-31
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公开(公告)号： US07313858B2公开(公告)日： 2008-01-01
- 发明人: Richard Hsiao , Prakash Kasiraj , Quang Le , Paul Phong Nguyen , Son Van Nguyen , Denny D. Tang , Patrick Rush Webb
- 申请人： Richard Hsiao , Prakash Kasiraj , Quang Le , Paul Phong Nguyen , Son Van Nguyen , Denny D. Tang , Patrick Rush Webb
- 申请人地址： NL Amsterdam
- 专利权人： Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人： Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人地址： NL Amsterdam
- 代理机构： Zilka-Kotab, PC
- 主分类号： G11B5/17
- IPC分类号： G11B5/17 ; G11B5/187
摘要：
A Damascene process is provided for manufacturing a coil structure for a magnetic head. During the manufacturing process, an insulating layer is initially deposited after which a photoresist layer is deposited. A silicon dielectric layer is then deposited on the photoresist layer. After masking the silicon dielectric layer, at least one channel is etched in the photoresist layer and the silicon dielectric layer. Then, a conductive seed layer is deposited in the at least one channel. The at least one channel is then ready to be filled with a conductive material and chemically/mechanically polished to define a coil structure.