发明授权
US07317571B2 Catadioptric projection optical system, exposure apparatus having the same, device fabrication method
失效
折反射投影光学系统，具有相同的曝光设备，器件制造方法
- 专利标题： Catadioptric projection optical system, exposure apparatus having the same, device fabrication method
- 专利标题（中）： 折反射投影光学系统，具有相同的曝光设备，器件制造方法
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申请号： US11196378申请日： 2005-08-02
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公开(公告)号： US07317571B2公开(公告)日： 2008-01-08
- 发明人: Takashi Kato , Chiaki Terasawa , Hirohiko Shinonaga
- 申请人： Takashi Kato , Chiaki Terasawa , Hirohiko Shinonaga
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Morgan & Finnegan LLP
- 优先权： JP2004-227364 20040803
- 主分类号： G02B27/18
- IPC分类号： G02B27/18
摘要：
A catadioptric projection optical for forming an image of the intermediate image onto a second object, the catadioptric projection optical system include, a first dioptric group including a first lens group that has a positive refractive power and a second lens group that has a positive refractive power, a catadioptric group including a concave mirror and a third lens group that an incidence light and reflected light from the concave mirror pass, and a second dioptric group. A first deflective reflector is arranged between the first lens group and the second lens group. A second deflective reflector is arranged between the second lens group and the third lens group or between the third lens group and the second dioptric group. A first intermediate image is formed between the second lens group and the concave mirror. A second intermediate image is formed between the concave mirror and the second dioptric group.
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