Invention Grant
US07319938B2 Method and system for processing commonality of semiconductor devices
有权
用于处理半导体器件通用性的方法和系统
- Patent Title: Method and system for processing commonality of semiconductor devices
- Patent Title (中): 用于处理半导体器件通用性的方法和系统
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Application No.: US11286255Application Date: 2005-11-22
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Publication No.: US07319938B2Publication Date: 2008-01-15
- Inventor: Eugene Wang , Jinghua Ni
- Applicant: Eugene Wang , Jinghua Ni
- Applicant Address: CN Shanghai
- Assignee: Semmiconductor Manufacturing International (Shanghai) Corporation
- Current Assignee: Semmiconductor Manufacturing International (Shanghai) Corporation
- Current Assignee Address: CN Shanghai
- Agency: Townsend and Towsend and Crew LLP
- Priority: CN200410025412 20040614
- Main IPC: G06F19/00
- IPC: G06F19/00

Abstract:
A method and system for processing commonality of semiconductor devices. The method includes providing a first plurality of semiconductor devices, providing a second plurality of semiconductor devices, obtaining a first plurality of measured values corresponding to a characteristic associated with the first plurality of semiconductor devices, obtaining a second plurality of measured values corresponding to the characteristic associated with the second plurality of semiconductor devices, performing a first statistical analysis for the first plurality of measured values, determining a first statistical distribution, performing a second statistical analysis for the second plurality of measured values, and determining a second statistical distribution. Moreover, the method includes processing information associated with the first statistical distribution and the second statistical distribution, and determining an indicator. Also, the method includes processing information associated with the indicator, determining a confidence level, processing information associated with the confidence level, and determining whether the characteristic is stable.
Public/Granted literature
- US20060247894A1 Method and system for processing commonality of semiconductor devices Public/Granted day:2006-11-02
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