发明授权
- 专利标题: Apparatus for lapping thin film magnetic heads
- 专利标题(中): 用于研磨薄膜磁头的装置
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申请号: US10938578申请日: 2004-09-13
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公开(公告)号: US07326102B2公开(公告)日: 2008-02-05
- 发明人: Ryuji Fujii , Hiroki Matsukuma
- 申请人: Ryuji Fujii , Hiroki Matsukuma
- 申请人地址: HK Kwai Chung JP Tokyo
- 专利权人: SAE Magnetics (H.K.) Ltd.,TDK Corporation
- 当前专利权人: SAE Magnetics (H.K.) Ltd.,TDK Corporation
- 当前专利权人地址: HK Kwai Chung JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2003-369205 20031029
- 主分类号: B24B49/00
- IPC分类号: B24B49/00 ; B24B51/00 ; B24B9/00
摘要:
A lapping method and apparatus is provided that increases the yield rate in the magnetic head slider manufacturing process. According to the invention, an apparatus for lapping thin film magnetic heads includes a jig block and a lapping plate. The jig block includes a first jig which holds a bar to be lapped, and second jig which holds a member for load sharing. The lapping plate is movable relative to the first jig and the second jig, and is contactable with the surface to be lapped of the bar held by the first jig and the member for load sharing held by the second jig for lapping.
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