发明授权
US07332266B2 Composition for forming anti-reflective coating for use in lithography
有权
用于形成用于光刻的抗反射涂层的组合物
- 专利标题: Composition for forming anti-reflective coating for use in lithography
- 专利标题(中): 用于形成用于光刻的抗反射涂层的组合物
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申请号: US10472695申请日: 2002-04-10
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公开(公告)号: US07332266B2公开(公告)日: 2008-02-19
- 发明人: Takahiro Kishioka , Shinya Arase , Ken-ichi Mizusawa
- 申请人: Takahiro Kishioka , Shinya Arase , Ken-ichi Mizusawa
- 申请人地址: JP Tokyo
- 专利权人: Nissan Chemical Industries, Ltd.
- 当前专利权人: Nissan Chemical Industries, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge PLC
- 优先权: JP2001-111230 20010410
- 国际申请: PCT/JP02/03576 WO 20020410
- 国际公布: WO02/086624 WO 20021031
- 主分类号: G03F7/23
- IPC分类号: G03F7/23
摘要:
A composition for forming anti-reflective coating for use in a lithographic process in manufacture of a semiconductor device, comprising as a component a resin containing cyanuric acid or a derivative thereof, or a resin containing a structural unit derived from cyanuric acid or a derivative thereof. The structural unit is preferably represented by formula (1): and can be contained in a main chain or a side chain, or both main chain and side chain of a resin. The anti-reflective coating for lithography obtained from the composition has a high reflection reducing effect and does not cause intermixing with a resist layer to give an excellent resist pattern. It has a higher selectivity in dry-etching compared with the resists.