发明授权
- 专利标题: Defect inspection apparatus
- 专利标题(中): 缺陷检查装置
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申请号: US10855320申请日: 2004-05-28
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公开(公告)号: US07333650B2公开(公告)日: 2008-02-19
- 发明人: Takayasu Yamamoto , Eiji Yonezawa , Taizo Umezaki
- 申请人: Takayasu Yamamoto , Eiji Yonezawa , Taizo Umezaki
- 申请人地址: JP Aichi
- 专利权人: Nidek Co., Ltd.
- 当前专利权人: Nidek Co., Ltd.
- 当前专利权人地址: JP Aichi
- 代理机构: Sughrue Mion, PLLC
- 优先权: JPP2003-153313 20030529; JPP2003-153384 20030529
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
A defect inspection apparatus for inspecting an object to be inspected for a defect by processing an image taken from the object, includes: neural networks provided respectively for individual defect types to be classified; a learning unit which makes the neural networks learn based on the corresponding defect types to be classified; and a defect detection unit which classifies and detects defect types using the neural networks that have learned.
公开/授权文献
- US20050002560A1 Defect inspection apparatus 公开/授权日:2005-01-06