Invention Grant
- Patent Title: Plasma source
- Patent Title (中): 等离子体源
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Application No.: US11127328Application Date: 2005-05-11
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Publication No.: US07342361B2Publication Date: 2008-03-11
- Inventor: Albert Rogers Ellingboe
- Applicant: Albert Rogers Ellingboe
- Applicant Address: IE Dublin
- Assignee: Dublin City University
- Current Assignee: Dublin City University
- Current Assignee Address: IE Dublin
- Agency: Seed IP Law Group PLLC
- Main IPC: H01J15/00
- IPC: H01J15/00

Abstract:
A plasma source is described. The source includes a reactive impedance element formed from a plurality of electrodes. By providing such a plurality of electrodes and powering adjacent electrodes out of phase with one another, it is possible to improve the characteristics of the plasma generated.
Public/Granted literature
- US20060254518A1 Plasma source Public/Granted day:2006-11-16
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