发明授权
- 专利标题: Methods of making magnetic write heads with use of linewidth shrinkage techniques
- 专利标题(中): 使用线宽收缩技术制造磁头的方法
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申请号: US10881782申请日: 2004-06-30
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公开(公告)号: US07343666B2公开(公告)日: 2008-03-18
- 发明人: Kim Y. Lee , Jyh-Shuey Jerry Lo , Dennis Richard McKean
- 申请人: Kim Y. Lee , Jyh-Shuey Jerry Lo , Dennis Richard McKean
- 申请人地址: NL Amsterdam
- 专利权人: Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人: Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人地址: NL Amsterdam
- 代理商 John J. Oskorep, Esq.; Rambod Nader
- 主分类号: G11B5/127
- IPC分类号: G11B5/127 ; H04R31/00
摘要:
In one illustrative example, a method for use in making a magnetic write head includes the steps of forming a first pole piece layer of a first pole piece; forming a patterned resist over the first pole piece layer; electroplating a pedestal over the first pole piece layer within a channel of the patterned resist; electroplating a metal gap layer over the pedestal within the channel of the patterned resist; forming a resist channel shrinking film over the patterned resist; baking the resist channel shrinking film over the patterned to thereby reduce a width of the channel; removing the resist channel shrinking film; electroplating a second pole piece within the reduced-width channel of the patterned resist; removing the patterned resist; and milling the pedestal, using the second pole piece as a mask, to form a central notched pedestal having side walls with angled slopes.
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