发明授权
- 专利标题: Cut-and-paste imprint lithographic mold and method therefor
- 专利标题(中): 切割和糊化印刷光刻模具及其方法
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申请号: US10992072申请日: 2004-11-19
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公开(公告)号: US07344955B2公开(公告)日: 2008-03-18
- 发明人: Matthew E. Colburn , Yves C. Martin , Theodore G. van Kessel , Hematha K. Wickramasinghe
- 申请人: Matthew E. Colburn , Yves C. Martin , Theodore G. van Kessel , Hematha K. Wickramasinghe
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: McGinn IP Law Group, PLLC
- 代理商 Ido Tuchman, Esq.
- 主分类号: H01L21/76
- IPC分类号: H01L21/76
摘要:
A method (and apparatus) of replicating a pattern on a structure, includes using imprint lithography to replicate a pattern formed on a first structure onto a portion of a second structure.