- 专利标题: Lithographic apparatus and device manufacturing method
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申请号: US10927532申请日: 2004-08-27
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公开(公告)号: US07345736B2公开(公告)日: 2008-03-18
- 发明人: Jan Jaap Kuit , Petrus Rutgerus Bartray , Dirk Jan Bijvoet , Jan Frederik Hoogkamp
- 申请人: Jan Jaap Kuit , Petrus Rutgerus Bartray , Dirk Jan Bijvoet , Jan Frederik Hoogkamp
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: G03B27/42
- IPC分类号: G03B27/42 ; G03B27/58
摘要:
A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.
公开/授权文献
- US20050280788A1 Lithographic apparatus and device manufacturing method 公开/授权日:2005-12-22