发明授权
- 专利标题： Illumination system particularly for microlithography
- 专利标题（中）： 照明系统特别适用于微光刻
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申请号： US11649199申请日： 2007-01-03
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公开(公告)号： US07348565B2公开(公告)日： 2008-03-25
- 发明人: Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
- 申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT AG
- 当前专利权人： Carl Zeiss SMT AG
- 当前专利权人地址： DE Oberkochen
- 代理机构： Ohlandt, Greeley, Ruggiero & Perle, L.L.P.
- 优先权： DE19819898 19980505; DE19903807 19990202; DE29902108U 19990208; WOPCT/EP00/07258 20000728
- 主分类号： G02B27/14
- IPC分类号： G02B27/14 ; G02B5/30 ; G02B17/00
摘要：
There is provided a projection exposure apparatus for microlithography using a wavelength less than or equal to 193 nm. The apparatus includes an optical element with a pupil raster element, and a projection objective with a real entrance pupil. The optical element is situated in or near a plane defined by the real entrance pupil.
公开/授权文献
- US20070120072A1 Illumination system particularly for microlithography 公开/授权日：2007-05-31
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