发明授权
- 专利标题： Stage apparatus and lithographic apparatus
- 专利标题（中）： 舞台装置和光刻设备
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申请号： US11523736申请日： 2006-09-20
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公开(公告)号： US07348752B1公开(公告)日： 2008-03-25
- 发明人: Hans Butler
- 申请人： Hans Butler
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： H01J37/20
- IPC分类号： H01J37/20
摘要：
A stage apparatus and a lithographic apparatus comprising such a stage apparatus are described. The stage apparatus includes an electromagnetic motor arranged to displace an object table, an electromagnetic actuator configured to position the object table and a device configured to provide a current to the stage apparatus such that, in use, an effect of a stray field of the electromagnetic motor on the electromagnetic actuator is at least partly compensated by the current.
公开/授权文献
- US20080067967A1 STAGE APPARATUS AND LITHOGRAPHIC APPARATUS 公开/授权日：2008-03-20
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