发明授权
- 专利标题： Mold for manufacturing a microlens substrate, a method of manufacturing microlens substrate, a microlens substrate, a transmission screen, and a rear projection
- 专利标题（中）： 用于制造微透镜基板的模具，制造微透镜基板的方法，微透镜基板，透射屏幕和后投影
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申请号： US11253261申请日： 2005-10-18
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公开(公告)号： US07349159B2公开(公告)日： 2008-03-25
- 发明人: Nobuo Shimizu
- 申请人： Nobuo Shimizu
- 申请人地址： JP
- 专利权人： Seiko Epson Corporation
- 当前专利权人： Seiko Epson Corporation
- 当前专利权人地址： JP
- 代理机构： Harness, Dickey & Pierce, P.L.C.
- 优先权： JP2004-307460 20041021
- 主分类号： G02B27/10
- IPC分类号： G02B27/10
摘要：
A mold 6 for manufacturing a microlens substrate 1 is disclosed. The microlens substrate is provided with a plurality of microlenses each having a predetermined convex shape. The mold is used to press a base material of the microlens substrate to form the plurality of microlenses thereon. The mold 6 has a roll shape having an outer peripheral surface, and a plurality of concave portions 61 each having a predetermined shape corresponding to the convex shape of each microlens are provided on the outer peripheral surface of the mold 6 for pressing the base material of the microlens substrate. In this case, the plurality of concave portions 61 are formed by means of an etching process with a mask.
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