发明授权
US07349575B2 Pattern inspection method and apparatus, and pattern alignment method
失效
图案检查方法和装置,以及图案对准方法
- 专利标题: Pattern inspection method and apparatus, and pattern alignment method
- 专利标题(中): 图案检查方法和装置,以及图案对准方法
-
申请号: US10872035申请日: 2004-06-18
-
公开(公告)号: US07349575B2公开(公告)日: 2008-03-25
- 发明人: Shinichi Hattori , Tohru Ida , Shuzo Matsuno
- 申请人: Shinichi Hattori , Tohru Ida , Shuzo Matsuno
- 申请人地址: JP Tokyo
- 专利权人: Nippon Avionics Co., Ltd.
- 当前专利权人: Nippon Avionics Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Blakely, Sokoloff, Taylor & Zafman
- 优先权: JP2003-184876 20030627; JP2003-195796 20030711; JP2003-202285 20030728
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
In a pattern inspection method, a master pattern serving as a reference and the continuous tone image of a pattern to be measured that is sensed by a camera are aligned. At least the position of a base in the continuous tone image of the pattern to be measured is detected on the basis of the master pattern. At least one threshold is set on the basis of the difference from at least the density value of the base. The continuous tone image of the pattern to be measured is binarized on the basis of the set threshold. The pattern to be measured is inspected by comparing the binarized pattern to be measured and the master pattern. A pattern inspection apparatus and alignment method are also disclosed.
公开/授权文献
信息查询