Invention Grant
- Patent Title: Vacuum measuring gauge
- Patent Title (中): 真空量规
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Application No.: US11389007Application Date: 2006-03-27
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Publication No.: US07352187B2Publication Date: 2008-04-01
- Inventor: Wolfram Knapp , Martin Wuest
- Applicant: Wolfram Knapp , Martin Wuest
- Applicant Address: CH Bad Ragaz
- Assignee: Inficon GmbH
- Current Assignee: Inficon GmbH
- Current Assignee Address: CH Bad Ragaz
- Agency: Oliff & Berridge, PLC
- Priority: EP05004855 20050304
- Main IPC: G01L21/30
- IPC: G01L21/30 ; G01N27/62

Abstract:
An electron-emitting cathode consists of an electrically conducting emitter layer attached to a side wall which consists of stainless steel and a gate which is fixed at a mall distance inside a concave emitter surface of the emitter layer. The cathode surrounds a reaction area containing a cylindrical grid-like anode and a central ion collector which consists of a straight axial filament. An ion collector current reflecting the density of the gas in the reaction region is measured by a current meter while a gate voltage is kept between the ground voltage of the emitter layer and a higher anode voltage and is regulated in such a way that an anode current is kept constant. The emitter layer may consists of carbon nanotubes, diamond-like carbon, a metal or a mixture of metals or a semiconductor material, e.g., silicon which may be coated, e.g., with carbide or molybdenum. The emitter surface can, however, also be a portion of the inside surface of the side wall roughened by, e.g., chemical etching. The gate may be a grid or it may be made up of patches of metal film covering spacers distributed over the emitter area or a metal film covering an electron permeable layer placed on the emitter surface.
Public/Granted literature
- US20060202701A1 Vacuum measuring gauge Public/Granted day:2006-09-14
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