Invention Grant
- Patent Title: Lithography system, control system and device manufacturing method
- Patent Title (中): 光刻系统，控制系统及器件制造方法
-
Application No.: US11497534Application Date: 2006-08-02
-
Publication No.: US07352439B2Publication Date: 2008-04-01
- Inventor: Franciscus Van De Mast , Johan Christiaan Gerard Hoefnagels , Johannes Onvlee , Reinder Teun Plug
- Applicant: Franciscus Van De Mast , Johan Christiaan Gerard Hoefnagels , Johannes Onvlee , Reinder Teun Plug
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.
Public/Granted literature
- US20080036983A1 Lithography system, control system and device manufacturing method Public/Granted day:2008-02-14
Information query
