发明授权
- 专利标题: X-ray generator and exposure apparatus having the same
- 专利标题(中): X射线发生器和具有其的曝光装置
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申请号: US11293284申请日: 2005-12-01
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公开(公告)号: US07352842B2公开(公告)日: 2008-04-01
- 发明人: Akira Miyake
- 申请人: Akira Miyake
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Morgan & Finnegan, LLP
- 优先权: JP2004-348036 20041201
- 主分类号: G21K5/00
- IPC分类号: G21K5/00
摘要:
An X-ray generator introducing an X-ray to an illumination optical system includes plural plasma light sources, and a reflector, movably arranged among the plural light sources, for switching light sources and for reflecting the X-ray from one of the plural light sources to the illumination optical system, wherein an angle between a plane determined by an optical axis of the X-ray emitted from the reflector and a line that connects the plural light sources to the reflector, and a polarization plane on which an electric field vector oscillates is between 45° and 135°, the polarization plane maximizing a reflectance to the X-ray of the illumination optical system.
公开/授权文献
- US20060138364A1 X-ray generator and exposure apparatus having the same 公开/授权日:2006-06-29