发明授权
- 专利标题: Optical system and photolithography tool comprising same
- 专利标题(中): 包括其的光学系统和光刻工具
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申请号: US11251300申请日: 2005-10-14
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公开(公告)号: US07355791B2公开(公告)日: 2008-04-08
- 发明人: Vladimir Kamenov , Toralf Gruner
- 申请人: Vladimir Kamenov , Toralf Gruner
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT AG
- 当前专利权人: Carl Zeiss SMT AG
- 当前专利权人地址: DE Oberkochen
- 代理机构: Fish & Richardson P.C.
- 主分类号: G02B5/30
- IPC分类号: G02B5/30
摘要:
An optical system, for example a lens for a photolithography tool, includes a group of optical elements (L1, L2) that each comprise a birefringent cubic crystal such as CaF2. The crystal lattices of the crystals have different orientations, e.g. for reducing the overall retardance of the group by mutual compensation. The [110] crystal axis of at least one optical element (L1, L2) is tilted with respect to an optical axis (34) of the system (10) by a predefined tilting angle (θ1, θ2) having an absolute value between 1° and 20°. This reduces the magnitude, but not significantly changes the orientation of intrinsic birefringence. By selecting an appropriate tilting angle it is possible to achieve a better performance of the optical system. For example, the overall retardance of the optical system may be reduced, or the angular retardance distribution may be symmetrized.
公开/授权文献
- US20060066764A1 Optical system and photolithography tool comprising same 公开/授权日:2006-03-30
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