发明授权
- 专利标题: Nanowire device and method of fabricating the same
- 专利标题(中): 纳米线器件及其制造方法
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申请号: US11406255申请日: 2006-04-19
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公开(公告)号: US07358524B2公开(公告)日: 2008-04-15
- 发明人: Hyo-sug Lee , Sung-hoon Lee , Young-gu Jin , Jong-seob Kim , Sung-il Park
- 申请人: Hyo-sug Lee , Sung-hoon Lee , Young-gu Jin , Jong-seob Kim , Sung-il Park
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 代理机构: Sughrue Mion, PLLC
- 优先权: KR10-2005-0036684 20050502
- 主分类号: H01L29/06
- IPC分类号: H01L29/06 ; H01L31/072 ; H01L31/109 ; H01L31/0328 ; H01L31/0336 ; H01L35/24 ; H01L51/00 ; H01L33/00
摘要:
A nanowire device having a structure allowing for formation of p-type and n-type doped portions in a nanowire, and a method of fabricating the same. The nanowire device includes a substrate, a first electrode layer formed on the substrate, a second electrode layer facing the first electrode layer, a plurality of nanowires interposed at a predetermined interval between the first electrode layer and the second electrode layer to connect the same, and an electrolyte containing an electrolytic salt filling spaces between the nanowires.
公开/授权文献
- US20070032076A1 Nanowire device and method of fabricating the same 公开/授权日:2007-02-08
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