发明授权
- 专利标题: Method of fabricating a head for perpendicular magnetic recording with a self-aligning side shield structure
- 专利标题(中): 用自对准侧屏蔽结构制造用于垂直磁记录的磁头的方法
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申请号: US11354139申请日: 2006-02-14
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公开(公告)号: US07367112B2公开(公告)日: 2008-05-06
- 发明人: James L. Nix , Neil Leslie Robertson , Mason Lamar Williams
- 申请人: James L. Nix , Neil Leslie Robertson , Mason Lamar Williams
- 申请人地址: NL Amsterdam
- 专利权人: Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人: Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人地址: NL Amsterdam
- 代理商 G. Marlin Knight
- 主分类号: G11B5/193
- IPC分类号: G11B5/193
摘要:
A method is provided for fabricating a head for perpendicular recording with self-aligning side shields. The voids where the side shields will be formed are milled into the layer of material for the pole tip to achieve self-alignment. A mask is patterned with openings defining initial shape of the pole piece tip nearest the air-bearing surface including the width and the point at which the pole tip widens out. A film of soft magnetic material to form the side shields is deposited over the wafer. A chemical-mechanical-polishing process is preferably used to remove the mask and the material deposited on it. A new mask is patterned over the predetermined area for the final shape of the pole tip and the side shields. The excess side shield material and pole tip material outside of the mask is then removed.
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