发明授权
- 专利标题: Method of manufacturing a thin film structure
- 专利标题(中): 制造薄膜结构的方法
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申请号: US10858999申请日: 2004-06-02
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公开(公告)号: US07370406B2公开(公告)日: 2008-05-13
- 发明人: Hisayuki Yazawa
- 申请人: Hisayuki Yazawa
- 申请人地址: JP Tokyo
- 专利权人: TDK Corporation
- 当前专利权人: TDK Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Brinks Hofer Gilson & Lione
- 优先权: JP2003-163088 20030609; JP2003-316950 20030909
- 主分类号: G11B5/17
- IPC分类号: G11B5/17
摘要:
A thin film magnetic head is described, the magnetic head having an insulating layer and a protrusion which has an upper portion and a base portion, and the upper portion has an extended portion. The insulating layer is present under the extending part. A method of manufacturing the magnetic head includes forming a first insulating layer around the lower core layer; simultaneously forming a coil layer by plating the lower core layer with a coil insulating underlayer interposed between the lower coil layer and a coil lead layer connected to the coil layer on the first insulating layer; forming a coil insulating layer of an inorganic material on the coil layer and the coil lead layer; and, simultaneously forming a first plating underlayer for forming an upper core layer by plating, a second plating underlayer on the first coil lead layer exposed through the plating-forming opening, and a current-carrying lead layer.
公开/授权文献
- US20040246623A1 Thin film structure and manufacturing method thereof 公开/授权日:2004-12-09