发明授权
US07371433B2 Composition of silicon-containing copolymer, solvent-soluble crosslinked silicon-containing copolymer, and cured articles obtained therefrom 有权
含硅共聚物,溶剂可溶性交联硅含量共聚物和由其获得的固化物的组成

  • 专利标题: Composition of silicon-containing copolymer, solvent-soluble crosslinked silicon-containing copolymer, and cured articles obtained therefrom
  • 专利标题(中): 含硅共聚物,溶剂可溶性交联硅含量共聚物和由其获得的固化物的组成
  • 申请号: US10506855
    申请日: 2003-04-04
  • 公开(公告)号: US07371433B2
    公开(公告)日: 2008-05-13
  • 发明人: Yuji Tashiro
  • 申请人: Yuji Tashiro
  • 申请人地址: US NJ Somerville
  • 专利权人: AZ Electronic Materials USA Corp.
  • 当前专利权人: AZ Electronic Materials USA Corp.
  • 当前专利权人地址: US NJ Somerville
  • 代理商 Alan P. Kass
  • 优先权: JP2002-111128 20020412
  • 国际申请: PCT/JP03/04336 WO 20030404
  • 国际公布: WO03/087228 WO 20031023
  • 主分类号: B05D3/02
  • IPC分类号: B05D3/02
Composition of silicon-containing copolymer, solvent-soluble crosslinked silicon-containing copolymer, and cured articles obtained therefrom
摘要:
A composition comprising a silicon-containing copolymer having a number-average molecular weight of 500 to 1,000,000, having SiO bond in the polymer and containing at least the structural units represented by the following general formulae (I) and (II) and, if necessary, one or more of the structural units represented by the following general formulae (III) to (VII) and a cross-linking agent is reacted at −20 to 100° C. for 1 to 3 hours. The resultant reaction composition is coated on a substrate and cured by heating to a temperature of 150° C. or above, for example, 250° C. to obtain a cured product of a silicon-containing copolymer which has a high heat resistance, a high light transmission, a low relative dielectric constant and a high chemical resistance and which has a strong mechanical strength and a good flexibility. wherein R1 to R6, R8 and R9 each independently represents an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group, an aralkyl group, an alkylamino group, an alkylsilyl group or an alkoxy group, R7 represents a divalent group, R10 represents a divalent aromatic group, and A represents NH or O.
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