发明授权
US07374857B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition
失效
每种含有相同的Bismide化合物，酸产生剂和抗蚀剂组合物以及从组合物形成图案的方法
- 专利标题： Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition
- 专利标题（中）： 每种含有相同的Bismide化合物，酸产生剂和抗蚀剂组合物以及从组合物形成图案的方法
-
申请号： US10496014申请日： 2002-11-28
-
公开(公告)号： US07374857B2公开(公告)日： 2008-05-20
- 发明人: Tsuneaki Maesawa , Fumiyoshi Urano , Masayuki Endo , Masaru Sasago
- 申请人： Tsuneaki Maesawa , Fumiyoshi Urano , Masayuki Endo , Masaru Sasago
- 申请人地址： JP Osaka JP Kadoma-Shi
- 专利权人： Wako Pure Chemical Industries Ltd.,Matsushita Electric Industrial Co., Ltd.
- 当前专利权人： Wako Pure Chemical Industries Ltd.,Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址： JP Osaka JP Kadoma-Shi
- 代理机构： Kratz, Quintos & Hanson, LLP
- 优先权： JP2001-366005 20011130; JP2002-120769 20020423
- 国际申请： PCT/JP02/12434 WO 20021128
- 国际公布： WO03/045915 WO 20030605
- 主分类号： G03C1/00
- IPC分类号： G03C1/00 ; C07D209/36
摘要：
The present invention relates to a novel bisimide compound useful as an acid generator for a chemically amplified resist composition used in manufacturing of semiconductor element and the like or a raw material for synthesizing heat resistant polymers, an acid generator and a resist composition using said compound and a method for pattern formation using said composition, and further relates to a synthetic n intermediate for a bisimide compound and a bis(N-hydroxy)phthalimide compound useful as an intermediate for a functional compound such as a heat resistant polymer or photosensitive material, and provides a bisimide compound shown by the general formula [1]: (wherein R and A1 are as defined in claim 1).
公开/授权文献
信息查询
