Invention Grant
- Patent Title: Projection system for EUV lithography
- Patent Title (中): EUV光刻投影系统
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Application No.: US11657420Application Date: 2007-01-24
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Publication No.: US07375798B2Publication Date: 2008-05-20
- Inventor: Russell Hudyma , Hans-Jürgen Mann , Udo Dinger
- Applicant: Russell Hudyma , Hans-Jürgen Mann , Udo Dinger
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agency: Ohlandt, Greeley, Ruggiero & Perle, L.L.P.
- Priority: DE19906001 19990215; DE19948240 19991007
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42 ; G02B5/10

Abstract:
There is provided an EUV optical projection system. The system includes a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror situated in an optical path from an object plane to an image plane, for imaging an object in said object plane into an image in said image plane. The image has a width W and a secant length SL, and the width W is greater than about 2 mm.
Public/Granted literature
- US20070153252A1 Projection system for EUV lithograhphy Public/Granted day:2007-07-05
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