Invention Grant
US07375798B2 Projection system for EUV lithography 有权
EUV光刻投影系统

Projection system for EUV lithography
Abstract:
There is provided an EUV optical projection system. The system includes a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror situated in an optical path from an object plane to an image plane, for imaging an object in said object plane into an image in said image plane. The image has a width W and a secant length SL, and the width W is greater than about 2 mm.
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