发明授权
- 专利标题: Ellipsoidal gapless microlens array and method of fabrication
- 专利标题(中): 椭圆形无间隙微透镜阵列及其制造方法
-
申请号: US11213816申请日: 2005-08-30
-
公开(公告)号: US07375892B2公开(公告)日: 2008-05-20
- 发明人: Ulrich C. Boettiger , Jin Li
- 申请人: Ulrich C. Boettiger , Jin Li
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Dickstein Shapiro LLP
- 主分类号: G02B27/10
- IPC分类号: G02B27/10
摘要:
Ellipse-shaped microlenses focus light onto unbalanced photosensitive areas, increase area coverage for a gapless layout of microlenses, and allow pair-wise or other individual shifts of the microlenses to account for asymmetrical pixels and pixel layout architectures. The microlenses may be fabricated in sets, with one set oriented differently from another set, and may be arranged in various patterns, for example, in a checkerboard pattern or radial pattern. The microlenses of at least one set may be substantially elliptical in shape. To fabricate a first set of microlenses, a first set of microlens material is patterned onto a support, reflowed under first reflow conditions, and cured. To fabricate a second set of microlenses, a second set of microlens material is patterned onto the support, reflowed under second reflow conditions, which may be different from the first conditions, and cured.
公开/授权文献
信息查询