发明授权
- 专利标题: Semiconductor integrated circuit device and method for manufacturing the same
- 专利标题(中): 半导体集成电路器件及其制造方法
-
申请号: US11085579申请日: 2005-03-22
-
公开(公告)号: US07379318B2公开(公告)日: 2008-05-27
- 发明人: Hiroyuki Yamauchi
- 申请人: Hiroyuki Yamauchi
- 申请人地址: JP Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JP Osaka
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2004-112102 20040406
- 主分类号: G11C17/10
- IPC分类号: G11C17/10 ; G11C11/41
摘要:
A semiconductor integrated circuit device includes a semiconductor substrate and a ROM region, an SRAM region and a peripheral circuit region which are formed on the semiconductor substrate. Further, a column switch region is provided adjacent to the ROM region. MOS transistors in the ROM region and channel regions of access transistors in the SRAM region have substantially the same p-type impurity concentration. Accordingly, the threshold voltages of the transistors are adjusted by making use of the great dependence of the threshold voltage of the transistor on the channel width.
公开/授权文献
信息查询