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US07379318B2 Semiconductor integrated circuit device and method for manufacturing the same 失效
半导体集成电路器件及其制造方法

Semiconductor integrated circuit device and method for manufacturing the same
摘要:
A semiconductor integrated circuit device includes a semiconductor substrate and a ROM region, an SRAM region and a peripheral circuit region which are formed on the semiconductor substrate. Further, a column switch region is provided adjacent to the ROM region. MOS transistors in the ROM region and channel regions of access transistors in the SRAM region have substantially the same p-type impurity concentration. Accordingly, the threshold voltages of the transistors are adjusted by making use of the great dependence of the threshold voltage of the transistor on the channel width.
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