发明授权
US07380690B2 Solution jet type fabrication apparatus, method, solution containing fine particles, wiring pattern substrate, device substrate
有权
溶液喷射型制造装置,方法,含有微粒的溶液,布线图案基板,装置基板
- 专利标题: Solution jet type fabrication apparatus, method, solution containing fine particles, wiring pattern substrate, device substrate
- 专利标题(中): 溶液喷射型制造装置,方法,含有微粒的溶液,布线图案基板,装置基板
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申请号: US10758398申请日: 2004-01-15
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公开(公告)号: US07380690B2公开(公告)日: 2008-06-03
- 发明人: Takuro Sekiya
- 申请人: Takuro Sekiya
- 申请人地址: JP Tokyo
- 专利权人: Ricoh Company, Ltd.
- 当前专利权人: Ricoh Company, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Cooper & Dunham, LLP
- 优先权: JP2003-009108 20030117; JP2003-009186 20030117; JP2003-399572 20031128
- 主分类号: B41J2/06
- IPC分类号: B41J2/06
摘要:
A solution jet type fabrication apparatus for fabricating a wiring pattern or a device, the solution jet type fabrication apparatus including a jet head for ejecting a droplet of a solution containing fine particles onto a substrate, so as to form a pattern, by vaporizing a volatile ingredient of the solution, and allowing a solid component to remain on the substrate, wherein the substrate has no liquid absorbing property, wherein the jet head includes a nozzle from which the droplet is ejected, the nozzle being formed from a material that has a greater hardness than that of the fine particles in the solution, wherein the nozzle has a size that is equal to or less than Φ20 μm, the nozzle satisfying a relation of 0.0001≦Dp/Do≦0.01, where Dp represents the diameter of each of the fine particles and Do represents the diameter of the nozzle, wherein each of the fine particles has a size that is equal to or less than the roughness of a surface of the substrate.
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