发明授权
- 专利标题: Filtered cathodic-arc plasma source
- 专利标题(中): 过滤阴极电弧等离子体源
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申请号: US10693482申请日: 2003-10-21
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公开(公告)号: US07381311B2公开(公告)日: 2008-06-03
- 发明人: Ivan I. Aksenov , Volodymyr E. Strelnytskiy , Volodymyr V. Vasylyev , Andrey A. Voevodin , John G. Jones , Jeffrey S. Zabinski
- 申请人: Ivan I. Aksenov , Volodymyr E. Strelnytskiy , Volodymyr V. Vasylyev , Andrey A. Voevodin , John G. Jones , Jeffrey S. Zabinski
- 申请人地址: US DC Washington
- 专利权人: The United States of America as represented by the Secretary of the Air Force
- 当前专利权人: The United States of America as represented by the Secretary of the Air Force
- 当前专利权人地址: US DC Washington
- 代理机构: AFMCLO/JAZ
- 代理商 Gerald B. Hollins
- 主分类号: C23C14/32
- IPC分类号: C23C14/32
摘要:
A filtered cathodic-arc plasma source of lower plasma losses and higher output plasma current to input current efficiency is disclosed. Plasma filtering is accomplished in a right angle bend magnetic filter arranged to include the effects of at least three added magnetic coils located at the right angle bend of the filter path. These magnetic coils and other filter attributes, including an array of transverse fins and a magnetic cusp trap in the filter path, achieve desirable magnetic flux paths, lower plasma collision losses and reduced undesired particle output from the plasma filter. Multiple cathode sources, multiple plasma output ports, Larmour radius influence, equipotential magnetic flux lines and electron/ion interaction considerations are also included in the plasma source. Application of the plasma source to film coating processes is included.
公开/授权文献
- US20070187229A1 Filtered cathodic-arc plasma source 公开/授权日:2007-08-16
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