发明授权
- 专利标题: Large-field scanning of charged particles
- 专利标题(中): 带电粒子的大场扫描
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申请号: US11280829申请日: 2005-11-15
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公开(公告)号: US07394069B1公开(公告)日: 2008-07-01
- 发明人: Kirk J. Bertsche
- 申请人: Kirk J. Bertsche
- 申请人地址: US CA Milpitas
- 专利权人: KLA-Tencor Technologies Corporation
- 当前专利权人: KLA-Tencor Technologies Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Okamoto & Benedicto LLP
- 主分类号: G21K1/00
- IPC分类号: G21K1/00
摘要:
One embodiment relates to a charged-particle beam apparatus. The apparatus includes at least a source for generating the charged-particle beam, a first deflector, and a second deflector. The first deflector is configured to scan the charged-particle beam in a first dimension. The second deflector is configured to deflect the scanned beam such that the scanned beam impinges telecentrically (perpendicularly) upon a surface of a target substrate. Other embodiments are also disclosed.
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