Invention Grant
US07394201B2 Field emission cathode gating for RF electron guns and planar focusing cathodes
有权
用于射频电子枪和平面聚焦阴极的场发射阴极门控
- Patent Title: Field emission cathode gating for RF electron guns and planar focusing cathodes
- Patent Title (中): 用于射频电子枪和平面聚焦阴极的场发射阴极门控
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Application No.: US11248661Application Date: 2005-10-11
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Publication No.: US07394201B2Publication Date: 2008-07-01
- Inventor: John W. Lewellen , John Noonan
- Applicant: John W. Lewellen , John Noonan
- Applicant Address: US IL Chicago
- Assignee: UChicago Argonne, LLC
- Current Assignee: UChicago Argonne, LLC
- Current Assignee Address: US IL Chicago
- Agent Joan Pennington
- Main IPC: H01J25/00
- IPC: H01J25/00

Abstract:
A novel method of gating electron emission from field-emitter cathodes for radio frequency (RF) electrode guns and a novel cathode that provides a focused electron beam without the need for magnetic fields or a curved cathode surface are provided. The phase and strength of a predefined harmonic field, such as the 3rd harmonic field, are adjusted relative to a fundamental field to cause a field emission cathode to emit electrons at predefined times for the generation of high-brightness electron beams. The emission time is gated responsive to the combined harmonic and fundamental fields and the response of the FE cathode to the combined fields. A planar focusing cathode includes a selected dielectric material, such as a ceramic material, to provide an electron beam emission surface. Metal surfaces are provided both radially around and behind the dielectric material to shape the electric fields that accelerate and guide the beam from the cathode surface.
Public/Granted literature
- US20060022598A1 Field emission cathode gating for RF electron guns and planar focusing cathodes Public/Granted day:2006-02-02
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