发明授权
- 专利标题: Photosensitive resin composition for optical waveguide formation and optical waveguide
- 专利标题(中): 用于光波导形成和光波导的光敏树脂组合物
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申请号: US10593815申请日: 2005-02-23
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公开(公告)号: US07394965B2公开(公告)日: 2008-07-01
- 发明人: Tomohiro Utaka , Hideaki Takase , Yuuichi Eriyama
- 申请人: Tomohiro Utaka , Hideaki Takase , Yuuichi Eriyama
- 申请人地址: JP Tokyo
- 专利权人: JSR Corporation
- 当前专利权人: JSR Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2004-084283 20040323
- 国际申请: PCT/JP2005/003418 WO 20050223
- 国际公布: WO2005/091027 WO 20050929
- 主分类号: G02B6/00
- IPC分类号: G02B6/00
摘要:
A radiation-sensitive resin composition for forming optical waveguides, which comprises (A) a novolac type epoxy resin and (B) a photo-acid generator. The composition is used as materials for a core portion 5 of an optical waveguide 1, and the like. In the composition, component (A) is represented by the following general formula (1). (In the formula, R1 is a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aralkyl group; and n is an integer from 0 to 10.) The composition is excellent in patterning properties and the like in curing process, and is also excellent in heat resistance, transmission characteristics, and long-term reliability after the optical waveguide has been formed.
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