Invention Grant
- Patent Title: Gas phase contaminant removal with low pressure drop
- Patent Title (中): 低压降气相污染物去除
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Application No.: US10857301Application Date: 2004-05-28
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Publication No.: US07399331B2Publication Date: 2008-07-15
- Inventor: Gregory M. Dobbs , Timothy Obee , Darren S. Sheehan , James D. Freihaut , Stephen O. Hay , Norberto O. Lemcoff , Joseph J. Sangiovanni , Mary Saroka , Robert C. Hall
- Applicant: Gregory M. Dobbs , Timothy Obee , Darren S. Sheehan , James D. Freihaut , Stephen O. Hay , Norberto O. Lemcoff , Joseph J. Sangiovanni , Mary Saroka , Robert C. Hall
- Applicant Address: US CT Farmington
- Assignee: Carrier Corporation
- Current Assignee: Carrier Corporation
- Current Assignee Address: US CT Farmington
- Agency: Bachman & LaPointe, P.C.
- Main IPC: B01D50/00
- IPC: B01D50/00
Abstract:
A system is disclosed which incorporates low pressure drop contaminant removal from gas phases or streams, which advantageously can be used to enhance efficiency, improve humidity characteristics, and reduce capital cost of air handing systems such as HVAC systems and the like. Placement of the low pressure drop contaminant removal mechanism for enhancing effectiveness of same is also disclosed.
Public/Granted literature
- US20050118078A1 Gas phase contaminant removal with low pressure drop Public/Granted day:2005-06-02
Information query
