发明授权
- 专利标题: High-purity (fluoroalkyl)benzene derivative and process for producing the same
- 专利标题(中): 高纯度(氟烷基)苯衍生物及其制备方法
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申请号: US10512990申请日: 2003-04-24
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公开(公告)号: US07405331B2公开(公告)日: 2008-07-29
- 发明人: Toshio Hidaka , Norio Fushimi , Takafumi Yoshimura , Takeshi Kawai
- 申请人: Toshio Hidaka , Norio Fushimi , Takafumi Yoshimura , Takeshi Kawai
- 申请人地址: JP Tokyo
- 专利权人: Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人: Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2002-128158 20020430
- 国际申请: PCT/JP03/05261 WO 20030424
- 国际公布: WO03/093212 WO 20031113
- 主分类号: C07C22/08
- IPC分类号: C07C22/08
摘要:
The process for producing a (fluoroalkyl)benzene derivative according to the present invention comprises a step of reducing the total content of group 3 to group 12 transition metals in an alkylbenzene derivative to 500 ppm or less in terms of metal atoms; a step of halogenating the branched alkyl group of the purified alkylbenzene derivative by a photohalogenation to obtain a (haloalkyl)benzene derivative; and a step of subjecting the (haloalkyl)benzene derivative to a halogen-fluorine exchange using HF in an amount of 10 mol or higher per one mole of the (haloalkyl)benzene derivative. The (fluoroalkyl)benzene derivative produced by the process is reduced in the content of impurities such as residual halogens and residual metals, and is useful as intermediates for functional chemical products for use in applications such as medicines and electronic materials.