发明授权
US07408631B2 Device for the range-resolved determination of scattered light, operating method, illumination mask and image-field mask
有权
用于范围分辨的散射光确定装置,操作方法,照明掩模和图像场掩模
- 专利标题: Device for the range-resolved determination of scattered light, operating method, illumination mask and image-field mask
- 专利标题(中): 用于范围分辨的散射光确定装置,操作方法,照明掩模和图像场掩模
-
申请号: US10960082申请日: 2004-10-08
-
公开(公告)号: US07408631B2公开(公告)日: 2008-08-05
- 发明人: Michael Arnz , Oswald Gromer , Gerd Klose , Joachim Stuehler , Matthias Manger
- 申请人: Michael Arnz , Oswald Gromer , Gerd Klose , Joachim Stuehler , Matthias Manger
- 申请人地址: DE Oerkochen
- 专利权人: Carl Zeiss SMT AG
- 当前专利权人: Carl Zeiss SMT AG
- 当前专利权人地址: DE Oerkochen
- 代理机构: Sughrue Mion, PLLC
- 优先权: DE10336299 20030804
- 主分类号: G01B9/00
- IPC分类号: G01B9/00 ; G01J1/00 ; G03B27/42
摘要:
An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium. Applications include, for example, the range-resolved determination of scattered light of projection objectives in microlithography projection-exposure systems.