Invention Grant
- Patent Title: Optically polarizing retardation arrangement, and a microlithography projection exposure machine
- Patent Title (中): 光学极化延迟布置和微光刻投影曝光机
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Application No.: US11337491Application Date: 2006-01-24
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Publication No.: US07411656B2Publication Date: 2008-08-12
- Inventor: Michael Totzeck , Birgit Enkisch , Karl-Heinz Schuster
- Applicant: Michael Totzeck , Birgit Enkisch , Karl-Heinz Schuster
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agency: Sughrue Mion, PLLC
- Priority: DE10124803 20010522
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/28 ; G03B27/42 ; G03B27/54

Abstract:
A retardation arrangement for converting an input radiation beam, incident from an input side of the retardation arrangement, into an output radiation beam which has over its cross section a spatial distribution of polarization states which can be influenced by the retardation arrangement and differs from the spatial distribution of polarization states of the input radiation, is designed as a reflective retardation arrangement. A useful cross section of the retardation arrangement has a multiplicity of retardation zones of different retardation effect. Such a mirror arrangement having a retardation effect varying as a function of location can be used to compensate undesired fluctuations in the polarization state over the cross section of an input radiation beam and/or to set specific output polarization states, for example in order to set radial or tangential polarization.
Public/Granted literature
- US20060152701A1 Optically polarizing retardation arrangement, and a microlithography projection exposure machine Public/Granted day:2006-07-13
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