发明授权
- 专利标题: Optically polarizing retardation arrangement, and a microlithography projection exposure machine
- 专利标题(中): 光学极化延迟布置和微光刻投影曝光机
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申请号: US11337491申请日: 2006-01-24
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公开(公告)号: US07411656B2公开(公告)日: 2008-08-12
- 发明人: Michael Totzeck , Birgit Enkisch , Karl-Heinz Schuster
- 申请人: Michael Totzeck , Birgit Enkisch , Karl-Heinz Schuster
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT AG
- 当前专利权人: Carl Zeiss SMT AG
- 当前专利权人地址: DE Oberkochen
- 代理机构: Sughrue Mion, PLLC
- 优先权: DE10124803 20010522
- 主分类号: G03B27/72
- IPC分类号: G03B27/72 ; G03B27/28 ; G03B27/42 ; G03B27/54
摘要:
A retardation arrangement for converting an input radiation beam, incident from an input side of the retardation arrangement, into an output radiation beam which has over its cross section a spatial distribution of polarization states which can be influenced by the retardation arrangement and differs from the spatial distribution of polarization states of the input radiation, is designed as a reflective retardation arrangement. A useful cross section of the retardation arrangement has a multiplicity of retardation zones of different retardation effect. Such a mirror arrangement having a retardation effect varying as a function of location can be used to compensate undesired fluctuations in the polarization state over the cross section of an input radiation beam and/or to set specific output polarization states, for example in order to set radial or tangential polarization.
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