发明授权
- 专利标题： Cleaning probe and megasonic cleaning apparatus having the same
- 专利标题（中）： 具有相同的清洁探头和超声波清洗装置
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申请号： US11240554申请日： 2005-10-03
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公开(公告)号： US07412982B2公开(公告)日： 2008-08-19
- 发明人: Sun-Jung Kim
- 申请人： Sun-Jung Kim
- 申请人地址： KR Suwon-Si, Gyeonggi-Do
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KR Suwon-Si, Gyeonggi-Do
- 代理机构： Volentine & Whitt, PLLC
- 优先权： KR10-2004-0079041 20041005
- 主分类号： B08B3/00
- IPC分类号： B08B3/00 ; B08B3/12 ; B08B6/00
摘要：
A cleaning probe capable of providing uniform cleaning to an entire wafer while not damaging the edge portion of the wafer, and a megasonic cleaning apparatus having the cleaning probe are provided. The cleaning probe comprises a front portion located near the center of the wafer, a rear portion connected to a piezoelectric transducer, and a protrusion located between the rear portion and the front portion, located on an edge portion of the wafer, and having a larger cross section width than the front portion.
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