发明授权
- 专利标题: Porous film-forming composition, patterning process, and porous sacrificial film
- 专利标题(中): 多孔成膜组合物,图案化工艺和多孔牺牲膜
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申请号: US11148371申请日: 2005-06-09
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公开(公告)号: US07417104B2公开(公告)日: 2008-08-26
- 发明人: Motoaki Iwabuchi , Yoshitaka Hamada , Tsutomu Ogihara , Takeshi Asano , Takafumi Ueda
- 申请人: Motoaki Iwabuchi , Yoshitaka Hamada , Tsutomu Ogihara , Takeshi Asano , Takafumi Ueda
- 申请人地址: JP Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2004-172236 20040610
- 主分类号: C08G77/08
- IPC分类号: C08G77/08 ; C08L83/04
摘要:
A porous film-forming composition is provided comprising (A) a polymer obtained by hydrolytic condensation of a hydrolyzable silane having formula (1): R1n—Si—R24-n (1) wherein R1 is a monovalent organic group or hydrogen, R2 is a hydrolyzable group or a hydroxyl group and n is an integer of 0 to 3, a hydrolyzate thereof or a partial condensate thereof, with the proviso that at least one silicon compound having an organic crosslinkable group as R1 is included, the polymer being capable of crosslinking reaction by the organic crosslinkable group, and (B) an organic solvent. The composition has improved storage stability, filling properties, adhesion and coating uniformity sufficient to form a sacrificial film which is dissolvable in a stripping solution.
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