发明授权
US07417271B2 Electrode structure having at least two oxide layers and non-volatile memory device having the same
有权
具有至少两个氧化物层的电极结构和具有其的非易失性存储器件
- 专利标题: Electrode structure having at least two oxide layers and non-volatile memory device having the same
- 专利标题(中): 具有至少两个氧化物层的电极结构和具有其的非易失性存储器件
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申请号: US11655193申请日: 2007-01-19
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公开(公告)号: US07417271B2公开(公告)日: 2008-08-26
- 发明人: Stefanovich Genrikh , Choong-rae Cho , In-kyeong Yoo , Eun-hong Lee , Sung-Il Cho , Chang-wook Moon
- 申请人: Stefanovich Genrikh , Choong-rae Cho , In-kyeong Yoo , Eun-hong Lee , Sung-Il Cho , Chang-wook Moon
- 申请人地址: KR Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR10-2006-0018879 20060227
- 主分类号: H01L31/062
- IPC分类号: H01L31/062
摘要:
An electrode structure having at least two oxide layers that more reliably switch and operate without the use of additional devices and a non-volatile memory device having the same are provided. The electrode structure may include a lower electrode, a first oxide layer formed on the lower electrode, a second oxide layer formed on the first oxide layer and an upper electrode formed on the second oxide layer wherein at least one of the first and second oxide layers may be formed of a resistance-varying material. The first oxide layer may be formed of an oxide having a variable oxidation state.
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