发明授权
US07427477B2 Method of activating a silicon surface for subsequent patterning of molecules onto said surface
失效
激活硅表面以便随后将分子图案化到所述表面上的方法
- 专利标题: Method of activating a silicon surface for subsequent patterning of molecules onto said surface
- 专利标题(中): 激活硅表面以便随后将分子图案化到所述表面上的方法
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申请号: US11003805申请日: 2004-12-03
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公开(公告)号: US07427477B2公开(公告)日: 2008-09-23
- 发明人: Jurina Wessels , William E. Ford , Akio Yasuda
- 申请人: Jurina Wessels , William E. Ford , Akio Yasuda
- 申请人地址: DE Cologne
- 专利权人: Sony Deutschland GmbH
- 当前专利权人: Sony Deutschland GmbH
- 当前专利权人地址: DE Cologne
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: EP03028132 20031205
- 主分类号: C12Q1/68
- IPC分类号: C12Q1/68 ; C12Q1/70 ; B05D5/00 ; B05D3/04 ; B05D3/10
摘要:
The present invention relates to a method of activating a silicon surface for subsequent patterning of molecules onto said surface, and to patterns produced by this method, and further to uses of said pattern.
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