发明授权
- 专利标题: Electron beam column for writing shaped electron beams
- 专利标题(中): 用于写入成形电子束的电子束柱
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申请号: US11243363申请日: 2005-10-03
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公开(公告)号: US07427765B2公开(公告)日: 2008-09-23
- 发明人: Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
- 申请人: Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
- 申请人地址: JP Tokyo
- 专利权人: Jeol, Ltd.
- 当前专利权人: Jeol, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Janah & Associates, P.C.
- 主分类号: A61N5/00
- IPC分类号: A61N5/00 ; G21G5/00
摘要:
An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.
公开/授权文献
- US20070085033A1 Electron beam column for writing shaped electron beams 公开/授权日:2007-04-19
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