Invention Grant
- Patent Title: Electron beam column for writing shaped electron beams
- Patent Title (中): 用于写入成形电子束的电子束柱
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Application No.: US11243363Application Date: 2005-10-03
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Publication No.: US07427765B2Publication Date: 2008-09-23
- Inventor: Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
- Applicant: Benyamin Buller , William J. DeVore , Juergen Frosien , Xinrong Jiang , Richard L. Lozes , Henry Thomas Pearce-Percy , Dieter Winkler , Steven T. Coyle , Helmut Banzhof
- Applicant Address: JP Tokyo
- Assignee: Jeol, Ltd.
- Current Assignee: Jeol, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Janah & Associates, P.C.
- Main IPC: A61N5/00
- IPC: A61N5/00 ; G21G5/00

Abstract:
An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.
Public/Granted literature
- US20070085033A1 Electron beam column for writing shaped electron beams Public/Granted day:2007-04-19
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